Gas Cluster Ion Beam (GCIB) Application Device
With our extensive development experience and network, we will develop the most suitable equipment to meet our customers' needs.
Our company has engineers who have developed and manufactured GCI devices for a wide range of applications, from industrial to research and development, and we provide GCI devices tailored to various customer needs. The processing method using GCI can achieve sub-nanometer level smoothness for materials that are considered difficult to process with conventional grinding methods, such as WC and diamond, as well as materials that are water-repellent during processing, represented by fluorides. Our GCI source is characterized by its ability to handle high currents, with a proven track record of 1mA (equivalent to several A in monomer ion terms) using SF6 gas clusters.
